Photoresist Monomers-Others-Photoresist Materials| 毕得医药

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1,3-Dioxo-1H-benzo[de]isoquinolin-2(3H)-yl trifluoromethanesulfonate: BD44686885342-62-797%; 登录 5g

Cyclohexyl 4-vinylbenzenesulfonate: BD706712211308-93-997% mix TBC as stabilizer; 登录

1,6-Divinylperfluorohexane: BD03701800-91-595% (stabilized with TBC); 登录 100g

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